Comparative studies of PST thin films as prepared by sol-gel, LDCVD and sputtering techniques

Integrated Ferroelectrics

Volumn 45, Issue , 2002, Pages 79-87

  Huang, Z ^a   Donohue, P P ^b   Zhang, O ^a   Williams, D ^b   Anthony, C J ^b   Todd, M A ^b   Whatmore, R W ^a  

^a CRANFIELD UNIVERSITY   (United Kingdom)

^b QINETIQ   (United Kingdom)

Author keywords

Liquid delivery CVD; PST; Sol gel; Sputtering; Thin films

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; LEAD COMPOUNDS; PERMITTIVITY; RAPID THERMAL ANNEALING; SOL-GELS; SPUTTER DEPOSITION;

LIQUID DELIVERY CHEMICAL VAPORIZE DEPOSITION (LDCVD); PYROELECTRIC COEFFICIENTS; THERMAL DETECTION;

THIN FILMS;

EID: 33745320628     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215349     Document Type: Article

References (5)

1. Shorrocks N M, Whatmore R W, and Osbond P C 1990 Ferroelectrics 106 387.
2. Whatmore R W and Watton R 2001 Pyroelectric materials and devices Infrared Detectors and Emitters: Materials and Devices, edited by P. Capper and C.T. Elliott, (London, Kluwer Academic Publishers).
3. Huang, P. P. Donohue, Q. Zhang, D. Williams, C. J. Anthony, M. A. Todd and R.W. Whatmore, to be published.
4. Todd M A, Donohue P P, Harper M A and Jones J C 2001 Integrated Ferroelectrics 35, 115.
5. Todd M A, Donohue P P, Jones J C, Wallis D J, Slater M J, Harper M A and Watton R 1999 Integrated Ferroelectrics 25,113.