An investigation of phase transformation behavior in sputter-deposited PtMn thin films

JOM

Volumn 58, Issue 6, 2006, Pages 50-54

  Ji, C X ^a   Ladwig, Peter F ^b   Ott, Ronald D ^c   Yang, Y ^d   Yang, Joshua J ^a   Chang, Y Austin ^a   Linville, Eric S ^e   Gao, Jenny ^e   Pant, Bharat B ^e  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b Hutchinson Technology Incorporated   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d CompuTherm LLC ^*  (United States)

^e SEAGATE TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; COMPUTER SIMULATION; DIFFERENTIAL SCANNING CALORIMETRY; PARAMAGNETIC MATERIALS; PHASE EQUILIBRIA; PHASE TRANSITIONS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ANTIFERROMAGNETIC PHASE; JOHNSON-MEHL-AVRAMI ANALYSIS; MAGNETORESISTIVE SPIN VALVES; PARAMAGNETIC STATE;

PLATINUM ALLOYS;

EID: 33745307522     PISSN: 10474838     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11837-006-0182-x     Document Type: Article

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