Analysis of O (1D) distribution by time-resolved measurement of ozone density for application of UV-light excited ozone to oxidation process

Shinku/Journal of the Vacuum Society of Japan

Volumn 49, Issue 3, 2006, Pages 123-125

  Tosaka, Aki ^a   Nishiguchi, Tetsuya ^a,b   Nonaka, Hidehiko ^a   Ichimura, Shingo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b MEIDENSHA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

OZONE DENSITY; REACTION MODEL; SILICON OXIDATION; TIME RESOLVED MEASUREMENT;

DENSITY MEASUREMENT (SPECIFIC GRAVITY); EXCIMER LASERS; KRYPTON; SILICA; ULTRAVIOLET RADIATION;

OZONE;

EID: 33745288195     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.49.123     Document Type: Article

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