Extending ion-track lithography to the low-energy ion regime

Journal of Applied Physics

Volumn 99, Issue 11, 2006, Pages

  Musket, R G ^a,b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Musket Consulting   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC STOPPING; ENERGY DEPOSITION; ETCHABLE LATENT TRACKS; ION-TRACK LITHOGRAPHY;

ARGON; ELECTRONS; IONS; NEON; POLYCARBONATES; PROBABILITY DISTRIBUTIONS; SCANNING ELECTRON MICROSCOPY; SCATTERING; THIN FILMS;

LITHOGRAPHY;

EID: 33745282707     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2200387     Document Type: Article

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