Demonstrating sub-nm closed loop MEMS flattening

Optics Express

Volumn 14, Issue 12, 2006, Pages 5558-5570

  Evans, Julia W ^a   Macintosh, Bruce ^a   Poyneer, Lisa ^a   Morzinski, Katie ^b   Severson, Scott ^b   Dillon, Daren ^b   Gavel, Donald ^b   Reza, Layra ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE OPTICS; CLOSED LOOP CONTROL SYSTEMS; ERROR ANALYSIS; FREQUENCIES; IMAGING SYSTEMS; VOLTAGE CONTROL; WAVEFRONTS;

ACTUATOR SPACING; CONTRAST IMAGING; MEMS FLATTENING; RESIDUAL WAVEFRONT ERRORS;

MICROELECTROMECHANICAL DEVICES;

EID: 33745125439     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.005558     Document Type: Article

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