New magnetron configurations for sputtered Nb onto Cu

Physica C: Superconductivity and its Applications

Volumn 441, Issue 1-2, 2006, Pages 102-107

  Lanza, G ^a,c   Bermudez, J ^a,c   Frigo, A ^a,c   Padamsee, H ^b   Palmieri, V ^a,c   Tonini, D ^c  

^a LABORATORI NAZIONALI DI LEGNARO   (Italy)

^b Newman Laboratory for Elementary Particle Physics   (United States)

^c UNIVERSITY OF PADOVA   (Italy)

Author keywords

Bias; Magnetron; Nb Cu; Niobium; Pulsed current mode; Sputtering; Superconductor

Indexed keywords

COPPER; MAGNETRON SPUTTERING; MICROSTRUCTURE; PLASMAS; SUBSTRATES; SUPERCONDUCTING MATERIALS; SUPERCONDUCTIVITY;

BIAS; DEPOSITION ANGLE; PLASMA CONFINEMENT EFFICIENCY; PULSED CURRENT MODE;

NIOBIUM;

EID: 33744908573     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2006.03.041     Document Type: Article

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