Unusual concentration impedance for catalytic copper deposition

Journal of Electroanalytical Chemistry

Volumn 590, Issue 2, 2006, Pages 126-137

  Diard, J P ^a   Montella, C ^b  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b NONE

Author keywords

Catalytic complexation; Copper deposition; EIS

Indexed keywords

CATALYSIS; CATALYSTS; COMPLEXATION; CONCENTRATION (PROCESS); ELECTRIC IMPEDANCE; ELECTRODEPOSITION;

CATALYTIC COMPLEXATION; CHLORIDE IONS; COPPER DEPOSITION; EIS;

COPPER;

EID: 33646867429     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2006.02.034     Document Type: Article

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