Application of fuzzy neural network to optimizing UV-LIGA process

Guangxue Jingmi Gongcheng/Optics and Precision Engineering

Volumn 14, Issue 1, 2006, Pages 139-144

  Zheng, Xiao Hu ^a,b   Zhu, Di ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b Huaiyin Institute   (China)

Author keywords

Fuzzy neural network; Negative photoresist; Process parameter; UV LIGA

Indexed keywords

ALGORITHMS; APPLICATIONS; EXPERIMENTS; FABRICATION; FORECASTING; IMAGE QUALITY; LEARNING ALGORITHMS; LITHOGRAPHY; MICROSTRUCTURE; NEURAL NETWORKS; OPTIMIZATION; PROCESSING; TECHNOLOGY; TEMPERATURE; THEORY; ULTRASONICS;

ARTIFICIAL NEURAL NETWORK; DEVELOPING TIME; FABRICATION STRUCTURE QUALITY; FEEDFORWARD FUZZY NEURAL NETWORK; FUZZY NEURAL NETWORK; GRADIENT DESCENT; HIGH RESOLUTE MICROSTRUCTURE; LEAST RELATIVE LINE WIDTH DISCREPANCY; LITHOGRAPHIC PROCESS; NEGATIVE PHOTORESIST; ORTHOGONALITY EXPERIMENT; PREDICTION MODEL; PROCESS PARAMETER; SOFT BAKE TIME; TECHNOLOGY PARAMETERS; THICKNESS; ULTRASONIC AGITATION; UV-LIGA;

PHOTORESISTS;

EID: 33646858603     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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