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Volumn 47, Issue 3, 2006, Pages 523-526

Near net-shape fabrication of superelastic NiTi device by sputtering and photoetching

Author keywords

Net shaped structure; Sputtering; Structuring; Superelasticity; Thin films; TiNi

Indexed keywords

DEPOSITION; ETCHING; MAGNETIC HYSTERESIS; MAGNETRON SPUTTERING; PHOTOLITHOGRAPHY; STRAIN CONTROL; TENSILE TESTING; THIN FILMS;

EID: 33646842727     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.47.523     Document Type: Article
Times cited : (7)

References (14)
  • 4
    • 0002220515 scopus 로고    scopus 로고
    • ed. by K. Otsuka and C. M. Wayman (Cambridge University Press, United Kingdom)
    • T. Saburi: Shape Memory Materials, ed. by K. Otsuka and C. M. Wayman (Cambridge University Press, United Kingdom, 1998) pp. 49-96.
    • (1998) Shape Memory Materials , pp. 49-96
    • Saburi, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.