Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Tanaka, Terumitsu ^a   Kurisu, Hiroki ^a   Matsuura, Mitsuru ^a   Shimosato, Yoshihiro ^b   Okada, Shigenobu ^b   Oshiro, Kazunori ^c   Fujimori, Hirotaka ^c   Yamamoto, Setsuo ^c  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b SHIMADZU CORPORATION   (Japan)

^c YAMAGUCHI UNIVERSITY GRADUATE SCHOOL OF MEDICINE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; NICKEL COMPOUNDS; OXIDATION; PLASMA APPLICATIONS; SPUTTERING; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ELECTRON CYCLOTRON RESONANCE SPUTTERING METHOD; MICROWAVE PLASMA; REACTIVE SPUTTERING METHOD; THERMALLY OXIDIZED SI SUBSTRATES;

ULTRATHIN FILMS;

EID: 33646751208     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2169538     Document Type: Article

References (9)

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