Influence of magnetic field on the tunneling current in magnetic 10-nm-scale point contact junctions using tunneling atomic force microscopy

Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 7246-7248

  Miyamoto, Yasuyoshi ^a   Kuga, Kiyoshi ^a   Hayashi, Naoto ^a   Machida, Kenji ^a   Aoshima, Ken Ichi ^a  

^a NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; COATINGS; DEPOSITION; ELECTRODES; INTERFACES (MATERIALS); ION BEAMS; IRON OXIDES; MAGNETIZATION; MAGNETORESISTANCE; NANOSTRUCTURED MATERIALS; POINT CONTACTS; SOFT MAGNETIC MATERIALS; SPUTTERING; STOICHIOMETRY;

MAGNETIC TUNNELING JUNCTIONS (MTJ); NANOCONTACTS; ROOM TEMPERATURE (RT); TUNNELING ATOMIC FORCE MICROSCOPY (TUNA);

TUNNEL JUNCTIONS;

EID: 2942696180     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1687536     Document Type: Conference Paper

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