Alkali ion intercalation in v2O5: Preparation and laboratory characterization of thin films produced by ALD

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 815-818

  Donsanti, F ^a   Kostourou, K ^a   Decker, F ^a   Ibris, N ^b   Salvi, A M ^b   Liberatore, M ^c   Thissen, A ^c   Jaegerman, W ^c   Lincot, D ^d  

^a SAPIENZA UNIVERSITY OF ROME   (Italy)

^b UNIVERSITY OF BASILICATA   (Italy)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^d PSL RESEARCH UNIVERSITY   (France)

Author keywords

ALD; Alkali ion insertion; Lithium; Thin film; V2O5

Indexed keywords

DEPOSITION; LITHIUM; LITHIUM BATTERIES; VACUUM APPLICATIONS;

ALD; ALKALI ION INSERTION; V2O5;

THIN FILMS;

EID: 33646710150     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2237     Document Type: Conference Paper

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