Structural and electrical properties of thin d.c. magnetron-sputtered gold films deposited on float glass

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 715-718

  Markert, Christian ^a   Lützenkirchen Hecht, Dirk ^a   Frahm, Ronald ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

AFM; Electrical resistivity; Sputtered gold films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE; GLASS; GOLD; IN SITU PROCESSING; POLYCRYSTALLINE MATERIALS; SURFACE ROUGHNESS; SURFACE STRUCTURE; THIN FILMS; TOPOLOGY;

AFM; FLOAT GLASSES; IN SITU ELECTRICAL RESISTIVITY; ISOCHRONOUS ANNEALING PROCESSES; SPUTTERED GOLD FILMS;

MAGNETRON SPUTTERING;

EID: 33646572903     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2258     Document Type: Conference Paper

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