Vapor-phase deposition for dense CeO 2 film growth on porous substrates

Journal of the Electrochemical Society

Volumn 153, Issue 6, 2006, Pages

  Mineshige, Atsushi ^a,f   Inaba, Minoru ^b,f   Nakanishi, Shinji ^c,e   Kobune, Masafumi ^a   Yazawa, Tetsuo ^a   Kikuchi, Kenji ^d   Ogumi, Zempachi ^c,f  

^a UNIVERSITY OF HYOGO   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

^c KYOTO UNIVERSITY   (Japan)

^d UNIVERSITY OF SHIGA PREFECTURE   (Japan)

^e Matsushita Battery Industrial Co Ltd   (Japan)

^f ELECTROCHEMICAL SOCIETY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE FILM; ELECTROCHEMICAL VAPOR DEPOSITION (EVD); OXYGEN POTENTIAL GRADIENT; VAPOR-PHASE DEPOSITION;

CERIUM COMPOUNDS; DEPOSITION; SOLID OXIDE FUEL CELLS; SUBSTRATES; VAPOR PHASE EPITAXY;

FILM GROWTH;

EID: 33646445165     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2186210     Document Type: Article

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