Growth and oxidation of aluminum thin films deposited on Ag(1 1 1)

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4167-4170

  Oughaddou, H ^a   Vizzini, S ^a   Aufray, B ^a   Ealet, B ^a   Gay, J M ^a   Biberian J P ^a   d'Avitaya, F A ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION; DISSOLUTION; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; OXIDATION; OXYGEN; SILVER; THIN FILMS;

BULK DIFFUSION COEFFICIENT; DISSOLUTION KINETICS; INTENSITIES VARIATIONS; OXIDE LAYER;

ALUMINUM;

EID: 33646194542     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.024     Document Type: Article

References (16)

1. Freund H.J., and Umbach E. Adsorption of Ordered Surfaces of Ionic Solids and Thin films (1993), Springer, Heidelberg
2. Moodera J.S., and Kinder L.R. J. Appl. Phys. 79 (1996) 4724
3. Chambers S.A. Surf. Sci. Rep. 39 (2000) 105
4. Franchy R. Surf. Sci. Rep. 38 (2000) 195
5. Park J.H., Lee G.S., Yang J.Y., Yoon K.S., Kim C.O., Hong J.P., and Kim H.J. Appl. Phys. Lett. 80 (2002) 3982
6. Rose V., Podgursky V., Costina I., and Franchy R. Surf. Sci. 541 (2003) 128
7. In: Klaus, and Shröder (Eds). CRC Handbook of Electrical Resistivities of Binary Metallic Alloys (1983), Chemical Rubber, Boca Raton, FL 44
8. Alford T.L., Adams D., Laursen T., and Ullrich B.M. Appl. Phys. Lett. 68 (1996) 23
9. Wang W., Lanford W.I., and Murarka S.P. Appl. Phys. Lett. 68 (1996) 12
10. Malgas G.F., Adams Daniel., Nguyen Phucanh., Wang Yu., Alford T.L., and Mayer J.W. Appl. Phys. Lett. 90 (2001) 11
11. Wang Y., and Alford T.L. Appl. Phys. Lett. 74 (1999) 1
12. Barbier A. Surf. Sci. 406 (1998) 69
13. Léandri C., Saifi H., Guillermet O., and Aufray B. Appl. Surf. Sci. 177 (2001) 303
14. T.B. Massalski, Binary Alloy Phase Diagrams, 2nd ed., The Material Society, 1992.
15. Landolt, Börnstein, Tome 2, Diffusion in festen metallen und legierungen, 1990.
16. Kiguchi M., Entani S., Saiki K., Goto T., and Koma A. Phys. Rev. B 68 (2003) 115402