High-speed data storage and processing for projection mask-less lithography systems

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 976-979

  Voss, Sven Hendrik ^a   Talmi, Maati ^a   Saniter, Juergen ^a   Eindorf, Juergen ^a   Reisig, Alexander ^a   Heinitz, Joachim ^b   Haugeneder, Ernst ^c  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

^b Vistec Electron Beam GmbH   (Germany)

^c IMS NANOFABRICATION AG   (Austria)

Author keywords

Hardware architecture; High speed buffer; Lossless data compression; Mask less lithography

Indexed keywords

COMPUTER ARCHITECTURE; DATA ACQUISITION; DATA COMMUNICATION EQUIPMENT; DATA STORAGE EQUIPMENT; FIELD PROGRAMMABLE GATE ARRAYS; LITHOGRAPHY;

HIGH-SPEED BUFFER; LOSSLESS DATA COMPRESSION; MASK-LESS LITHOGRAPHY;

DATA PROCESSING;

EID: 33646069031     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.033     Document Type: Article

References (2)

1. Döring H.J., et al. Proof-of-concept tool development for projection mask-less lithography (PML2). Proc. SPIE 5751 (2005) 355-365
2. S.-H. Voss, M. Talmi, Lossless high-speed data compression for optical interconnects as used in mask-less lithography systems, in: MNE 2005 International Conference, Microelectron. Eng.