A manufacturable miniature electron beam column

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 984-989

  Spallas, James P ^a   Silver, Charles S ^a   Muray, Lawrence P ^a   Wells, Torquil ^b   El Gomati, Mohamed ^c  

^a Novelx Inc   (United States)

^b York Probe Sources Ltd   (United Kingdom)

^c UNIVERSITY OF YORK   (United Kingdom)

Author keywords

e Beam lithography; Maskless lithography; Microfabrication; Thermal field emitter

Indexed keywords

ELECTROSTATICS; MICROMACHINING; MINIATURE INSTRUMENTS; OPTICAL INTERCONNECTS; OPTIMIZATION; SEMICONDUCTOR MATERIALS;

E-BEAM LITHOGRAPHY; MASKLESS LITHOGRAPHY; MICROFABRICATION; THERMAL FIELD EMITTER;

ELECTRON BEAMS;

EID: 33646051246     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.245     Document Type: Article

References (4)

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3. Kim H.S., Yu M.L., Kratschmer E., Hussey B.W., Thomson M.G.R., and Chang T.H.P. J. Vac. Sci. Technol. B 14 6 (1996)
4. de Jonge N., Iamy Y., Schoots K., and Oosterkamp T.H. Nature 420 (2002) 393