Removal mechanism of nano-bubble with AFM for immersion lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 655-658

  Kawai, Akira ^a   Suzuki, Kenta ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; ArF and F2 excimer resists; Atomic force microscope; Immersion lithography; Nano scale bubble; Removal; Thermodynamics

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; BUBBLES (IN FLUIDS); LITHOGRAPHY; REMOVAL;

ARF AND F2 EXCIMER RESISTS; IMMERSION LITHOGRAPHY; NANO-SCALE BUBBLE;

NANOSTRUCTURED MATERIALS;

EID: 33646050026     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.029     Document Type: Article

References (6)

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3. Kawai A., Ishikawa A., Niiyama T., Harumoto M., Tamada O., and Sanada M. SPIE ML 5753 (2005) 94
4. Niiyama T., and Kawai A. J. Photopolym. Sci. Technol. 18 (2005) 373
5. Kawai A. J. Photopolym. Sci. Technol. 18 (2005) 348
6. B. Budhlall, X. He, I. Hyder, S. Mehta, G. Parris, Proceedings of International Symposium on Immersion & 157 nm Lithography, (2004).