Study of mechanisms involved in photoresist microlens formation

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1087-1090

  Audran, S ^a,b   Faure, B ^a   Mortini, B ^a   Regolini, J ^a   Schlatter, G ^b   Hadziioannou, G ^b  

^a STMICROELECTRONICS   (France)

^b UNIVERSITÉ DE STRASBOURG   (France)

Author keywords

Crosslinking; Microlens; Reflow method; Rheological properties

Indexed keywords

CROSSLINKING; PHOTORESISTORS; REACTION KINETICS; RHEOLOGY;

PHOTORESIST MICROLENS; REFLOW METHOD; RHEOLOGICAL PROPERTIES;

MICROLENSES;

EID: 33646030627     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.150     Document Type: Article

References (5)

1. Hartmann D.M., et al. Proc. SPIE 4089 (2000) 496-507
2. Ong N.S., et al. J. Micro. Eng. 60 (2002) 365-379
3. Popovic Z.D., et al. Appl. Opt. 27 (1988) 1281-1284
4. O'Neill F.T., and Sheridan J.T. Optik 113 (2002) 391-404
5. Schilling A., et al. Opt. Eng. 39 (2000) 2171-2176