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Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 951-955

Status and future of maskless lithography

Author keywords

Cost of ownership; Maskless lithography

Indexed keywords

COMPUTER SIMULATION; COSTS; ELECTRONS; MANUFACTURE; OPTICAL RESOLVING POWER;

EID: 33646029711     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.016     Document Type: Article
Times cited : (10)

References (10)
  • 1
    • 33646053449 scopus 로고    scopus 로고
    • L. Pain, B. Icard, S. Manakli, J. Todeschini, B. Minghetti, V. Wang, D. Henry, From R&D to Manufacturing: the Insertion of EBDW Lithography into a Production Flow, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 2
    • 33646065304 scopus 로고    scopus 로고
    • Available from: .
  • 3
    • 33646072432 scopus 로고    scopus 로고
    • S. Edler-Kapl et al., Projection Mask less Lithography: First Results from Multi Beam Blanking Demonstrator, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 4
    • 33646029074 scopus 로고    scopus 로고
    • M. Mohaupt, et al., Assembly of an Aperture Plate System for Projection Maskless Lithography, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 6
    • 33646067735 scopus 로고    scopus 로고
    • J. Spallas, A Manufacturable Miniature Electron Beam Column, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 7
    • 33646035779 scopus 로고    scopus 로고
    • E. Platzgummer et al., Simulation of Ion Beam Direct Structuring for 3D nano-imprint Template Fabrication, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 8
    • 33646057297 scopus 로고    scopus 로고
    • U. Dauderstädt et al., SLM Technology for Microlithography, in: Proceedings of Micro-and Nano-Engineering (in press).
  • 9
    • 33646060373 scopus 로고    scopus 로고
    • A. Bleeker et al., Optical Maskless Lithography for fast and economical design to wafer, Proceedings of Micro-and Nano-Engineering (in press).
  • 10
    • 33646072758 scopus 로고    scopus 로고
    • H. Smith, Comparison of Optical and Charged Particle Maskless lithography, Proceedings of Micro-and Nano-Engineering (in press).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.