A micrometric thickness silicon diode proposed as a microdosimeter

IEEE Transactions on Nuclear Science

Volumn 53, Issue 1, 2006, Pages 312-316

  Fazzi, Alberto ^a,b,c   Agosteo, Stefano ^b,c   Pola, Andrea ^b,c   Varoli, Vincenzo ^b,c   Zotto, Pierluigi ^d,e  

^a IEEE   (Italy)

^b POLITECNICO DI MILANO   (Italy)

^c INFN SEZIONE DI MILANO   (Italy)

^d UNIVERSITY OF PADOVA   (Italy)

^e SEZIONE DI PADOVA   (Italy)

Author keywords

Field funnelling; Microdosimetry; Sensitive volume; Silicon diode; Silicon microdosimetry

Indexed keywords

FIELD FUNNELLING; MICRODOSIMETRY; SENSITIVE VOLUME; SILICON MICRODOSIMETRY;

FIELD EFFECT SEMICONDUCTOR DEVICES; ION IMPLANTATION; MICROMETERS; NEUTRONS; POLYETHYLENES; SILICON;

DIODES;

EID: 33645686854     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNS.2006.869832     Document Type: Article

References (12)

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