MOCVD growth of epitaxial pyrochlore Bi2Ti2 O7 thin film

Journal of the European Ceramic Society

Volumn 26, Issue 10-11, 2006, Pages 2155-2159

  Suzuki, Muneyasu ^a   Watanabe, Takayuki ^a   Takenaka, Tadashi ^b   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Capacitors; Films

Indexed keywords

CAPACITORS; EPITAXIAL GROWTH; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS; THIN FILMS;

EPITAXIAL PYROCHLORE; POLE FIGURE MEASUREMENT;

BISMUTH COMPOUNDS;

BISMUTH COMPOUNDS; CAPACITORS; EPITAXIAL GROWTH; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS; THIN FILMS;

EID: 33645562218     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2005.09.103     Document Type: Conference Paper

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