Dedicated spectrophotometer for localized transmittance and reflectance measurements

Applied Optics

Volumn 45, Issue 7, 2006, Pages 1386-1391

  Abel Tiberini, Laëtitia ^a   Lemarquis, Frédéric ^a   Lequime, Michel ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; OPTICAL FILTERS; OPTICAL PROPERTIES; OPTICAL RESOLVING POWER; OPTIMIZATION;

DEPOSITION CHAMBER; NONUNIFORM COATINGS; SPECTRAL RESOLUTION;

SPECTROPHOTOMETERS;

EID: 33645304846     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.001386     Document Type: Article

References (6)

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2. C. Grèzes-Besset, "Uniformity in thin-film production," in Thin Films for Optical Systems, F. Flory, ed. (Marcel Dekker, 1995), pp. 249.
3. C. Grèzes-Besset, F. Chazallet, G. Albrand, and E. Pelletier, "Synthesis and research of the optimum conditions for the optical monitoring of non-quarter-wave multilayers," Appl. Opt. 32, 5612-5618 (1993).
4. F. Villa and O. Pompa, "Emission pattern of real vapour sources in high vacuum: an overview," Appl. Opt. 38, 695-703 (1999).
5. F. Flory, E. Pelletier, G. Albrand, and Y. Hu, "Surface optical coatings by ion assisted deposition techniques: study of uniformity," Appl. Opt. 28, 2952-2589 (1989).
6. A. Piegari, "Metal/dielectric coatings for transmission filters with wide rejection bands," in Advances in Optical Thin Films, C. Amra, N. Kaiser, H. A. Macleod, eds., Proc. SPIE 5250, 343-348 (2003).