C60 films as etching masks for creation of micrometer and submicrometer YBa2Cu3O7 structures

Physica C: Superconductivity and its Applications

Volumn 435, Issue 1-2, 2006, Pages 37-40

  Vincenc Obona J ^a   Chromik, S ^a   Spankova M ^a   Oszi, Zs ^a   Kostic I ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b INSTITUTE OF INFORMATICS   (Slovakia)

Author keywords

Etching; Fullerene C60; Submicrometer; YBCO

Indexed keywords

ARGON; ETCHING; ION BEAMS; MASKS; POLYMETHYL METHACRYLATES; SEMICONDUCTING FILMS;

ETCHING MASK; SUBMICROMETER; YBCO;

FULLERENES;

EID: 33645022740     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2006.01.014     Document Type: Conference Paper

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