Flux dependence of the morphology of a tetracene film on hydrogen-passivated Si(100)

Physical Review B - Condensed Matter and Materials Physics

Volumn 73, Issue 12, 2006, Pages

  Shi, J ^a   Qin, X R ^a  

^a UNIVERSITY OF GUELPH   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33644935827     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.73.121303     Document Type: Article

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