Systematic study of the size and spacing dependence of Ag nanoparticle enhanced fluorescence using electron-beam lithography

Applied Physics Letters

Volumn 88, Issue 10, 2006, Pages

  Corrigan, T D ^d   Guo, S H ^d   Szmacinski, H ^a   Phaneuf, R J ^b,c  

^a Microcosm Inc   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c LABORATORY FOR PHYSICAL SCIENCES   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

LOCAL MAXIMA; PARTICLE PLASMON POLARITONS; RESONANT COUPLING; SEMICONDUCTING SUBSTRATE;

ELECTRIC FIELD EFFECTS; ELECTRON BEAM LITHOGRAPHY; ELEMENTARY PARTICLES; NANOSTRUCTURED MATERIALS; SUBSTRATES;

SILVER;

EID: 33644918304     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2176862     Document Type: Article

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