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Volumn 41, Issue 5, 2006, Pages 1659-1662

Elaboration and characterization of MOCVD (Bi1- x Sb x )2 Te3 thin films

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; BISMUTH; ELECTRIC CONDUCTIVITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TELLURIUM; X RAY DIFFRACTION;

GROWTH TEMPERATURE; PYREX SUBSTRATE; SEEBACK COEFFICIENT;

THIN FILMS;

EID: 33644910488 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-005-2033-5 Document Type: Article

Times cited : (16)

References (15)

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