Performance evaluation of a newly developed electrolytic system for stable thinning of silicon wafers

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 15-19

  Islam, M M ^a   Senthil Kumar, A ^a   Balakumar, S ^b   Lim, H S ^a   Rahman, M ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

IE assisted ELID; Self sharpening ability; Single crystal silicon wafers; Thinning performance

Indexed keywords

ELECTROLYSIS; GRINDING WHEELS;

IE ASSISTED ELID; SELF SHARPENING ABILITY; SINGLE CRYSTAL SILICON WAFERS; THINNING PERFORMANCE;

SILICON WAFERS;

EID: 33644905254     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.023     Document Type: Conference Paper

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