Utilization of nonlinear conditions in precision grinding with ELID (electrolytic in-process dressing) for fabrication of hard material components

CIRP Annals - Manufacturing Technology

Volumn 46, Issue 1, 1997, Pages

  Ohmori, H ^a   Nakagawa, T ^b  

^a RIKEN   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Electrode oxidation; Grinding performance; In process dressing

Indexed keywords

FABRICATION; NONLINEAR SYSTEMS; OXIDATION; PRECISION ENGINEERING;

ELECTROLYTIC IN PROCESS DRESSING (ELID);

GRINDING (MACHINING);

EID: 0030655988     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0007-8506(07)60821-x     Document Type: Article

References (7)

1. Ohmori,H., Nakagawa,T., 1990, Mirror Surface Grinding of Silicon Wafers with Electrolytic In-Process Dressing, Annals of the CIRP,Vol.39, 1:329-332
2. Ohmori,H., 1992, Electrolytic In-Process Dressing (ELID) Grinding Technique for Ultraprcision Mirror Surface Machining, Int Journal,JSPE, Vol.26, No.4:273-278
3. Ohmori,H., 1993, Influence of Electrical Conditions on Ultraprecision Mirror Surface Grinding with Electrolytic In-Process Dressing(ELID), Proceedings of 1st Int.ABTEC Conference, JSGE:68-73
4. Ohmori,H., Takahashi,I., 1994, Efficient Grinding Technique Utilizing Electrolytic In-Process Dressing for Precision Machining of Hard Materials, Advancement of Intelligent Production, Elsevier Science/JSPE:315-320
5. Ohmon,H., Nakagawa,T., 1995, Analysis of Mirror Surface Generation of Hard and Brittle Materials by ELID(Electrolytic In-Process Dressmg)-Grinding with Superfine Gram Metallic Bond Wheels, Annals of the CIRP, Vol 44,1: 287-290
6. König,W., Wagemann,A., 1993, Machining of Ceramic Components: Process-Technological Potentials. Machining of Advanced Materials, Proceedings of the Int. Conference on Machining of Advanced Materials, NIST: 3-16
7. Wobker,H G., Tönshoff,H. K., 1993, High Efficiency Grinding of Structural Ceramics, Machining of Advanced Materials, Proceedings of the Int Conference on Machining of Advanced Materials, NIST: 171-183