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Journal of Photochemistry and Photobiology A: Chemistry

Volumn 179, Issue 1-2, 2006, Pages 142-148

Photochemical synthesis of ultrafine organosilicon particles from trimethyl(2-propynyloxy)silane and carbon disulfide

(5) Morita, Hiroshi a Nozawa, Ryo a Bastl, Zdeněk b Šubrt, Jan c Pola, Josef d

a CHIBA UNIVERSITY (Japan)

b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY (Czech Republic)

c INSTITUTE OF INORGANIC CHEMISTRY (Czech Republic)

d INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS (Czech Republic)

Author keywords

Carbon disulfide; Photo polymerization; Trimethyl(2 propynyloxy)silane; Ultrafine particles

Indexed keywords

EID: 33644781867 PISSN: 10106030 EISSN: None Source Type: Journal
DOI: 10.1016/j.jphotochem.2005.08.003 Document Type: Article

Times cited : (10)

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