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Volumn 81, Issue 6, 2005, Pages 141-155

The importance of ultra-high voltage electron microscopy in materials science

(1)  Fujita, Hiroshi a,b  

b NONE   (Japan)

Author keywords

Amorphization; Electron channeling; Foreign atom implantation; in situ observation; Objective aperture effect; Simultaneous reflection

Indexed keywords


EID: 33644595785     PISSN: 03862208     EISSN: 03862208     Source Type: Journal    
DOI: 10.2183/pjab.81.141     Document Type: Review
Times cited : (4)

References (61)
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    • 33644590983 scopus 로고
    • Hirsch, P. B. (1962) J. Phys. Soc. Jpn. 17 (Suppl. B-II), 143-154.
    • (1962) J. Phys. Soc. Jpn. , vol.17 , Issue.SUPPL. B-II , pp. 143-154
    • Hirsch, P.B.1
  • 21
    • 0345170624 scopus 로고
    • received November 17, 1972
    • Fujita, H., and Tabata, T. (1973) Jpn. J. Appl. Phys. 12, 471-472 (received November 17, 1972).
    • (1973) Jpn. J. Appl. Phys. , vol.12 , pp. 471-472
    • Fujita, H.1    Tabata, T.2
  • 26
    • 84996181163 scopus 로고
    • Howie, A. (1966) Phil. Mag. 14, 223-237.
    • (1966) Phil. Mag. , vol.14 , pp. 223-237
    • Howie, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.