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Volumn , Issue 2, 2005, Pages 1023-1025

Integrated gate driver circuit using a-Si TFT

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; GATES (TRANSISTOR); NETWORKS (CIRCUITS); OPTIMIZATION; SHIFT REGISTERS;

EID: 33644584221     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (3)
  • 1
    • 0000845604 scopus 로고
    • Threshold voltage shift of amorphous silicon thin-film transistors during pulse operation
    • December
    • Ryoji Oritsuki et al., "Threshold Voltage Shift of Amorphous Silicon Thin-Film Transistors During Pulse Operation", J. J. Appl. Phys. Vol.30, No.12B, December, 1991, pp.3719-3723
    • (1991) J. J. Appl. Phys. , vol.30 , Issue.12 B , pp. 3719-3723
    • Oritsuki, R.1
  • 2
    • 0001463894 scopus 로고    scopus 로고
    • Relative importance of the Si-Si bond and Si-H bond for the stability of amorphous silicon thin film transistors
    • R.B.Wehrspohn et al., "Relative importance of the Si-Si bond and Si-H bond for the stability of amorphous silicon thin film transistors", J. Appl. Phys. Vol.87, No.1, pp. 144-154
    • J. Appl. Phys. , vol.87 , Issue.1 , pp. 144-154
    • Wehrspohn, R.B.1
  • 3
    • 0038580982 scopus 로고    scopus 로고
    • Kinetics of defect creation in amorphous silicon thin film transistors
    • R. B. Wehrspohn et al., "Kinetics of defect creation in amorphous silicon thin film transistors", J. Appl. Phys. Vol.93, No.9, pp.5780-5788
    • J. Appl. Phys. , vol.93 , Issue.9 , pp. 5780-5788
    • Wehrspohn, R.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.