Influence of substrate temperature on ultraviolet emission of ZnO films prepared by ultrasonic spray pyrolysis

Journal of Materials Science

Volumn 41, Issue 2, 2006, Pages 431-435

  Choi, Mu Hee ^a   Ma, Tae Young ^a  

^a Gyeongsang National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; PYROLYSIS; ULTRASONICS; ULTRAVIOLET RADIATION; ZINC OXIDE;

MGO FILMS; ULTRASONIC SPRAY PYROLYSIS;

THIN FILMS;

EID: 33644559096     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10853-005-2280-5     Document Type: Article

References (28)

1. C. H. KWON, H.-K. HONG, D. H. YUN, K. S.-T. KIM, Y.-H. RHO and B.-H. LEE, Sensors Actuators B 24/25 (1995) 610.
2. T. Y. MA and S. C. LEE, J. Mater. Sci. 11 (2000) 305.
3. K. H. KIM, K. C. PARK and T. Y. MA, J. Appl. Phys. 81 (1997) 7764.
4. S. SHIRAKATA, T. SAKEMI, K. AWAI and T. YAMAMOTO, Thin Solid Films 451/452 (2004) 212.
5. Y. CHEN, N. T. TUAN, YUSABURO SEGAWA, H.-.J. KO, S.-K. HONG and T. YAO, Appl. Phys. Lett. 78 (2001) 1469.
6. C. BOEMARE, T. MONTEIRO, M. J. SOARES, J. G. GUILHERME and E. ALVES, Physica B 308-310 (2001) 985.
7. H. KUMANO, A. A. ASHRAFI, A. UETA, A. AVRAMESCU and I. SUEMUNE, J. Cryst. Growth 214/215 (2000) 280.
8. Y. CHEN, D. BAGNALL and T. YAO, Mater. Sci. Eng. B 75 (2000) 190.
9. X. T. ZHANG, Y. C. LIU, Z. Z. ZHI, J. Y. ZHANG, Y. M. LU, D. Z. SHEN, W. XU, X. W. FAN and X. G. KONG, J. Lumin. 99 (2002) 149.
10. D. C. REYNOLDS, C. W. LITTON and T. C. COLLINS, Phys. Rev. 140 (1965) A1726.
11. C. KLINGSHIRM, Phys. Stat. Sol. (b) 71 (1975) 547.
12. J. GUTOWSKI, N. PRESSER and I. BROSER, Phys. Rev. B 38 (1989) 9746.
13. S. A. STUDENIKIN, M. COCIVERA, W. KELLNER and H. PASCHER, J. Lumin. 91 (2000) 223.
14. K. VANHEUSDEN, C. H. SEAGER, W. L. WARREN, D. R. TALLANT and J. A. VOIGT, Appl. Phys. Lett. 68 (1996) 403.
15. H. S. KANG, J. S. KANG, S. S. PANG, E. S. SHIM, S. Y. LEE, Mater. Sci. Eng. B 102 (2003) 313.
16. T. MINAMI, H. NANTO and S. TAKADA, Jpn. J. Appl. Phys. 24 (1985) L605.
17. M. OHYAMA, H. KOZUKA and T. YOKO, Thin Solid Films 306 (1997) 78.
18. A. C. JONES, S. A. RUSHWORTH and J. AULD, J. Cryst. Growth 146 (1995) 503.
19. K. T. RAMAKRISHNA REDDY and R. W. MILES, J. Mater. Sci. Lett. 17 (1998) 279.
20. TOMOAKI TERASAKO, SHO SHIRAKATA and TETSUYA KARIYA, Thin Solid Films 420/421 (2002) 13.
21. D. M. BAGNALL, Y. F. CHEN, M. Y. SHEN, Z. ZHU, T. GOTO and T. YAO, J. Cryst. Growth 184/185 (1998) 605.
22. T. MAKINO, C. H. CHIA, N. T. TUAN, Y. SEGAWA, M. KAWASAKI, A. OHTOMA, K. TAMURA, H. KOINUMA, Appl. Phys. Lett. 76 (2000) 3549.
23. P. ZU, Z. K. TANG, G. K. L. WONG, M. KAWASAKI, A. OHTOMO, H. KOINUMA and Y. SEGAWA, Solid State Commune. 103 (1997) 459.
24. T. Y. MA and D. K. SHIM, Thin Solid Films 410 (2002) 8.
25. A. YAMAMOTO, K. MIYAJIMA, T. GOTO, H. J. KO and T. YAO, Phys. Stat. Sol. (b) 229 (2002) 871.
26. K. P. O' DONELL and X. CHEN, Appl. Phys. Lett. 58 (1991) 2924.
27. M. O'NEILL, M. OESTRIECH, W. W. RUHLE and D. E. ASHENFORD, Phys. Rev. B 48 (1993) 8980.
28. E. MOLLWO, in "Semiconductors: physics of II-VI and I-VII compounds" (Springer, Berlin, 1982) p. 35.