Plasma oxidation and nitridation system for 90- To 65-nm node processes

Hitachi Review

Volumn 52, Issue 3, 2003, Pages 161-165

  Ogawa, Unryu ^a,b,c   Shimeno, Kazuhiro ^a,b   Sato, Noriyoshi ^c,d,e,f   Furukawa, Ryoichi ^g,h  

^a HITACHI KOKUSAI ELECTRIC INC   (Japan)

^b Toyama Works of the Semiconductor Equipment Division   (Japan)

^c JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^d TOHOKU UNIVERSITY   (Japan)

^e National Laboratory for High Energy Physics   (Japan)

^f Japan Society of Plasma Science and Nuclear Fusion Research   (Japan)

^g HITACHI LTD   (Japan)

^h Device Development Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33644489437     PISSN: None     EISSN: 0018277X     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. Yunlog LI et al., "Production of Uniform Large-diameter Radio-frequency Discharge Plasma," Appl. Phys. Lett. 65 (1), 28 (July 1994).
2. Yunlog LI et al., "Production of Large-diameter Uniform Plasma by Modified Magnetron-typed Radio-frequency Discharge," Jpn. J. Appl. Phys. 36, 4554 (1997).