Improvement in buried silicon nitride silicon-on-insulator structures by fluorine-ion implantation

Journal of Applied Physics

Volumn 83, Issue 7, 1998, Pages 3668-3677

  Rauthan, C M S ^a   Virdi, G S ^a   Pathak, B C ^a   Karthigeyan, A ^a  

^a CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33644479456     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366587     Document Type: Article

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