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Volumn 153, Issue 2, 1996, Pages 395-399

Study on F+ ion implantation in SIMOX materials

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; FLUORINE; OXIDES; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SEPARATION; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030080617     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211530213     Document Type: Article
Times cited : (1)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.