Axial image superposing (Super-flex) effect using the mask modulation method for optical lithography

Japanese Journal of Applied Physics

Volumn 30, Issue 11S, 1991, Pages 3037-3042

  Fukuda, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Coherence; Depth of focus; Image superposition; Optical lithography; Phase shifting mask; Resolution; Super FLEX effect

Indexed keywords

AMPLITUDE MODULATION; INTEGRATED CIRCUITS - MASKS; MATHEMATICAL TRANSFORMATIONS - FOURIER TRANSFORMS; PHASE MODULATION;

AXIAL IMAGE SUPERPOSING EFFECT;

LITHOGRAPHY;

EID: 0026259211     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.3037     Document Type: Article

References (5)

1. M. D. Levenson, H. S. Viswanathan and R. A. Simpson: IEEETrans. Electron Devices ED-29 (1982) 1828.
2. H. Fukuda, N. Hasegawa, T. Tanaka and T. Hayashida: IEEE Electron Device Lett. EDL8 (1987) 179.
3. H. Fukuda, T. Terasawa and S. Okazaki: To be published in J. Vac. Sei. technol B9 (1991).
4. T. Terasawa, N. Hasegawa, T. Kurosaki and T. Tanaka: Proc. SPIE’s 1989 Symp. on Microlithography 1088 (1989) 25.
5. A. Nitayama, T. Sato, K. Hashimoto, F. Shigemitsu and M. Nakase: Int. Electron Device Meet.’89 Technical Digest (IEEE, New York 1989) p. 57.