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Physical Review B - Condensed Matter and Materials Physics

Volumn 71, Issue 17, 2005, Pages

Simulation of copper atom diffusion via the vacancy mechanism in a dilute Fe-Cu alloy

(4) Arokiam, A C a Barashev, A V a Bacon, D J a Osetsky, Yu N a,b

a UNIVERSITY OF LIVERPOOL (United Kingdom)

b OAK RIDGE NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33344466271 PISSN: 10980121 EISSN: 1550235X Source Type: Journal
DOI: 10.1103/PhysRevB.71.174205 Document Type: Article

Times cited : (29)

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