Self-organized antireflective nanostructures on PMMA by ion etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5965, Issue , 2005, Pages

  Kaless, A ^a   Schulz, U ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Antireflection; Nanostructures; Plasma treatment; PMMA; Polymer optics

Indexed keywords

CHEMICAL MODIFICATION; CRYSTAL STRUCTURE; PLASMAS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SURFACE TREATMENT;

ANTIREFLECTION; LOW-PRESSURE PLASMA TREATMENT; POLYMER OPTICS;

NANOSTRUCTURED MATERIALS;

EID: 33244495968     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.623547     Document Type: Conference Paper

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