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Volumn , Issue , 2003, Pages 247-250
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Investigation of electron and hole mobilities in MOSFETs with TiN/HfO2/SiO2 gate stack
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Author keywords
[No Author keywords available]
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Indexed keywords
GATE STACKS;
MOSFETS;
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EID: 33244481339
PISSN: 19308876
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ESSDERC.2003.1256860 Document Type: Conference Paper |
Times cited : (4)
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References (10)
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