Suppression of surface micro-roughness of silicon wafer by addition of alcohol into ultra pure water for rinsing peocess

ECS Transactions

Volumn 1, Issue 3, 2006, Pages 51-58

  Yamamoto, M ^a   Nii, K ^b   Morinaga, H ^a   Teramoto, A ^a   Ohmi, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Stella Chemifa Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; CLEANING; SURFACE ROUGHNESS;

ISOPROPYL ALCOHOL (IPA); SILICON SURFACE; SURFACE MICRO-ROUGHNESS;

SILICON WAFERS;

EID: 32844460318     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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