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Surface and Coatings Technology

Volumn 200, Issue 12-13, 2006, Pages 4078-4081

Nucleation and growth of DC magnetron sputtered titanium diboride thin films

(3) Mishra, Suman K a Rupa, P K P a Pathak, L C a

a NATIONAL METALLURGICAL LABORATORY (India)

Author keywords

Hard coatings; Nucleation and growth; Thin films; Titanium diboride

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORIDES; CONDUCTIVE FILMS; FILM GROWTH; MAGNETRON SPUTTERING; MICROHARDNESS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

HARD COATINGS; LAYERED GROWTH; NANO-CRYSTALLINITY; TITANIUM DIBORIDE;

PROTECTIVE COATINGS;

ATOMIC FORCE MICROSCOPY; BORIDES; CONDUCTIVE FILMS; FILM GROWTH; MAGNETRON SPUTTERING; MICROHARDNESS; NUCLEATION; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 32644484522 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.10.006 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.