Deposition and characterization of μc-Ge1-xCx thin films grown by hot-wire chemical vapor deposition using organo-germane

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 202-205

  Yashiki, Yasutoshi ^a   Miyajima, Shinsuke ^a   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Germane; Hot wire deposition; Microcrystalline; Raman scattering

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DISSOCIATION; ORGANOMETALLICS; RAMAN SCATTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

GERMANE; HOT-WIRE DEPOSITION; MICROCRYSTALLINE;

WIRE;

EID: 32644465064     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.174     Document Type: Conference Paper

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