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Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 452-455

Micro-crystalline phase formation in hot wire deposited Si:C:H alloy films from pure methane and silane mixtures

(4) Kumbhar, A A a Dusane, R O a Bauer, S b Schroder B b

a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY (India)

b Rheinland Pfälzische Technische Universität Kaiserslautern Landau (Germany)

Author keywords

Hot wire technique; Microcrystalline phase; Silicon carbon alloy films

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELLIPSOMETRY; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; METHANE; SILANES; SILICON ALLOYS; SPECTROPHOTOMETRY;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SEMICONDUCTING FILMS;

EID: 0032066790 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(98)00334-2 Document Type: Article

Times cited : (17)

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