SCOPUS 정보 검색 플랫폼

Materials Research Bulletin

Volumn 41, Issue 3, 2006, Pages 536-540

Oxygen-plasma treatment for low-temperature processing of lead-zirconate-titanate thin films

(4) Park, Eung Ryul a Jang, Hyuk Kyoo a Kang, Eung Kil a Lee, Cheol Eui a

a Korea University (South Korea)

Author keywords

A. Thin films; B. Epitaxial growth; C. Photoelectron spectroscopy; D. Ferroelectricity

Indexed keywords

EPITAXIAL GROWTH; FERROELECTRICITY; HYSTERESIS; LEAD COMPOUNDS; LOW TEMPERATURE EFFECTS; MICROWAVES; PLASMAS; POLARIZATION; SOL-GELS; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC HYSTERESIS; LEAD-ZIRCONATE-TITANATE; OXYGEN-PLASMA TREATMENT; REMANENT POLARIZATIONS;

FERROELECTRIC THIN FILMS;

EID: 32644440106 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2005.09.010 Document Type: Article

Times cited : (2)

References (15)

1
- 21544465649
- J.F. Scott, C.A. Arujo, B.M. Melnick, L.D. McMillan, and R. Zuleeg J. Appl. Phys. 70 1991 382
- (1991) J. Appl. Phys. , vol.70 , pp. 382
- Scott, J.F.¹ Arujo, C.A.² Melnick, B.M.³ McMillan, L.D.⁴ Zuleeg, R.⁵

2
- 0001156603
- H. Tabata, T. Kawai, O. Murata, and J. Fujioka Appl. Phys. Lett. 59 1991 2354
- (1991) Appl. Phys. Lett. , vol.59 , pp. 2354
- Tabata, H.¹ Kawai, T.² Murata, O.³ Fujioka, J.⁴

3
- 0028513152
- T. Mihara, H. Watanabe, and C.A. Arujo Jpn. J. Appl. Phys. 33 1992 5281
- (1992) Jpn. J. Appl. Phys. , vol.33 , pp. 5281
- Mihara, T.¹ Watanabe, H.² Arujo, C.A.³

4
- 0002704179
- C.H. Peng, and S.B. Desu Appl. Phys. Lett. 61 1992 16
- (1992) Appl. Phys. Lett. , vol.61 , pp. 16
- Peng, C.H.¹ Desu, S.B.²

5
- 0025306137
- M. Sayer, and K. Screenivas Science 247 1990 1056
- (1990) Science , vol.247 , pp. 1056
- Sayer, M.¹ Screenivas, K.²

6
- 0032108352
- Z. Huang, Q. Zhang, and R. Whatmore J. Mater. Sci. Lett. 17 1998 1157
- (1998) J. Mater. Sci. Lett. , vol.17 , pp. 1157
- Huang, Z.¹ Zhang, Q.² Whatmore, R.³

7
- 0032613385
- Z. Huang, Q. Zhang, and R. Whatmore J. Appl. Phys. 85 1999 7355
- (1999) J. Appl. Phys. , vol.85 , pp. 7355
- Huang, Z.¹ Zhang, Q.² Whatmore, R.³

8
- 0001361956
- H.K. Jang, S.K. Lee, C.E. Lee, S.J. Noh, and W.I. Lee Appl. Phys. Lett. 76 2000 882
- (2000) Appl. Phys. Lett. , vol.76 , pp. 882
- Jang, H.K.¹ Lee, S.K.² Lee, C.E.³ Noh, S.J.⁴ Lee, W.I.⁵

9
- 0029371320
- M. Chen, J. Wu, and T. Wu Jpn. J. Appl. Phys. 34 1995 4870
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 4870
- Chen, M.¹ Wu, J.² Wu, T.³

10
- 0028517627
- K.G. Brooks, I.M. Reaney, R. Klissurska, Y. Huang, L. Bursill, and N. Setter J. Mater. Res. 9 1994 2540
- (1994) J. Mater. Res. , vol.9 , pp. 2540
- Brooks, K.G.¹ Reaney, I.M.² Klissurska, R.³ Huang, Y.⁴ Bursill, L.⁵ Setter, N.⁶

11
- 30244503504
- M. Klee, R. Eusemann, R. Waser, and W. Brandt J. Appl. Phys. 72 1992 1566
- (1992) J. Appl. Phys. , vol.72 , pp. 1566
- Klee, M.¹ Eusemann, R.² Waser, R.³ Brandt, W.⁴

12
- 0030083566
- Y. Liu, and P. Phule J. Am. Ceram. Soc. 79 1996 495
- (1996) J. Am. Ceram. Soc. , vol.79 , pp. 495
- Liu, Y.¹ Phule, P.²

13
- 0001523821
- N. Floquet, J. Hector, and P. Gaucher J. Appl. Phys. 84 1998 3815
- (1998) J. Appl. Phys. , vol.84 , pp. 3815
- Floquet, N.¹ Hector, J.² Gaucher, P.³

14
- 0036802006
- E.K. Kang, H.K. Jang, S.K. Lee, E.R. Park, C.E. Lee, K.M. Kim, S.J. Noh, and S.-J. Yeom Curr. Appl. Phys. 2 2002 407
- (2002) Curr. Appl. Phys. , vol.2 , pp. 407
- Kang, E.K.¹ Jang, H.K.² Lee, S.K.³ Park, E.R.⁴ Lee, C.E.⁵ Kim, K.M.⁶ Noh, S.J.⁷ Yeom, S.-J.⁸

15
- 0035905278
- H.S. Kim, C.H. Lee, C.E. Lee, K.M. Kim, S.J. Noh, C.S. Hong, and H.-C. Ri Appl. Phys. Lett. 79 2001 4177
- (2001) Appl. Phys. Lett. , vol.79 , pp. 4177
- Kim, H.S.¹ Lee, C.H.² Lee, C.E.³ Kim, K.M.⁴ Noh, S.J.⁵ Hong, C.S.⁶ Ri, H.-C.⁷

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.