Hydrogenation of polycrystalline silicon thin films

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 144-148

  Honda, S ^a   Mates, T ^a   Knizek K ^a   Ledinsky M ^a   Fejfar, A ^a   Kocka J ^a   Yamazaki, T ^b   Uraoka, Y ^b   Fuyuki, T ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Atmospheric pressure chemical vapour deposition; Hydrogen molecules; Hydrogen passivation; Photoluminescence; Polycrystalline silicon; Raman spectroscopy; Si H2 bonding

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; HYDROGENATION; PHOTOLUMINESCENCE; POLYSILICON; RAMAN SPECTROSCOPY; SOLAR CELLS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOUR DEPOSITION; HYDROGEN MOLECULES; HYDROGEN PASSIVATION; SI-H2 BONDING;

THIN FILMS;

EID: 32644437952     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.144     Document Type: Conference Paper

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