Evaluation of arsenical emission from semiconductor and opto-electronics facilities in Hsinchu, Taiwan

Atmospheric Environment

Volumn 40, Issue 10, 2006, Pages 1901-1907

  Chein, HungMin ^a   Hsu, Yu Du ^a   Aggarwal, Shankar G ^a   Chen, Tzu Ming ^a   Huang, Chun Chao ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Ambient concentration; Arsenical emission; Risk assessment; Semiconductor and opto electronics facilities

Indexed keywords

AIR POLLUTION; AIR QUALITY; FLUE GASES; OPTOELECTRONIC DEVICES; RISK ASSESSMENT; SEMICONDUCTOR DEVICES; TOXIC MATERIALS;

AIR POLLUTANTS; AMBIENT CONCENTRATION; ARSENICAL EMISSION; SEMICONDUCTOR AND OPTO-ELECTRONICS FACILITIES;

ARSENATE MINERALS;

ARSENIC;

ARSENIC; ATMOSPHERIC POLLUTION; ELECTRONICS INDUSTRY; INDUSTRIAL EMISSION; RISK ASSESSMENT;

AIR MONITORING; AIR POLLUTANT; AIR SAMPLING; AMBIENT AIR; ARTICLE; ATMOSPHERIC DEPOSITION; CANCER RISK; CANCER SUSCEPTIBILITY; ELECTRONICS INDUSTRY; EXHAUST GAS; PARTICULATE MATTER; PRIORITY JOURNAL; PROBABILITY; RISK ASSESSMENT; SEMICONDUCTOR;

ASIA; EURASIA; FAR EAST; HSINCHU; TAIWAN;

EID: 32544454198     PISSN: 13522310     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.atmosenv.2005.09.050     Document Type: Article

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