Inorganic acid emission factors of semiconductor manufacturing processes

Journal of the Air and Waste Management Association

Volumn 54, Issue 2, 2004, Pages 218-228

  Chein, HungMin ^a   Ming Chen, Tzu ^a   Aggarwal, Shankar Gopala ^a   Tsai, Chuen Jinn ^b   Huang, Chun Chao ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMATOGRAPHIC ANALYSIS; CORRELATION METHODS; ENVIRONMENTAL PROTECTION; INORGANIC ACIDS; REGRESSION ANALYSIS; SEMICONDUCTOR DEVICE MANUFACTURE;

ACID EMISSION FACTORS;

INDUSTRIAL EMISSIONS;

HYDROCHLORIC ACID; HYDROFLUORIC ACID; INORGANIC ACID; SULFURIC ACID;

AIR POLLUTANT; AIR POLLUTION; ARTICLE; ENVIRONMENTAL PROTECTION; ION PAIR CHROMATOGRAPHY; PRIORITY JOURNAL; REGRESSION ANALYSIS; SEMICONDUCTOR; TAIWAN;

EID: 0942265471     PISSN: 10962247     EISSN: 21622906     Source Type: Journal    
DOI: 10.1080/10473289.2004.10470898     Document Type: Article

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