Friction and wear of diamondlike carbon films deposited using different methods under different conditions

New Diamond and Frontier Carbon Technology

Volumn 8, Issue 1, 1998, Pages 51-64

  Tanaka, Akihiro ^a   Ko, Myoung Wan ^b   Kim, Seong Young ^b   Lee, Sang Hyun ^b   Kumagai, Tai ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Korea Institute of Industrial Technology   (South Korea)

^c Nanotec Co   (Japan)

Author keywords

CVD; Deposition method; DLC film; Friction; Gas pressure; PVD; Substrate bias voltage; Substrate material; Wear

Indexed keywords

EID: 3242758858     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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