Behavior of second-phase particles in Al5052 alloy during anodizing in a sulfuric acid solution CSLM observation

Journal of the Electrochemical Society

Volumn 151, Issue 7, 2004, Pages

  Moon, S M ^a   Sakairi, M ^a   Takahashi, H ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; DEFECTS; DISSOLUTION; ELECTROLYTIC POLISHING; IMAGE ANALYSIS; LASER BEAMS; MICROANALYSIS; MORPHOLOGY; PHOSPHORIC ACID; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SULFURIC ACID; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CONFOCAL SCANNING LASER MICROSCOPY (CSLM); SECOND-PHASE PARTICLES; ULTRAMICROTOME; ULTRASONIC AGITATION;

ALUMINUM ALLOYS;

EID: 3242688252     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1752933     Document Type: Article

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